UCT Plasma Spray Coatings are best-in-class for advanced-node etch chambers.
The shift toward more 3D, high-aspect-ratio geometries in leading-edge nodes is driving tighter
patterning, higher aspect ratios and zero-defect requirements. Etch chambers must accurately transfer
features through complex, multi-material stacks with narrow selectivity windows—often requiring
more reactive chemistries and tighter chamber-condition control. These harsher plasma environments
accelerate wear of plasma-facing chamber components, driving rapid degradation, particle generation, and
higher cost of ownership as nodes advance.
UCT addresses these challenges with a portfolio of plasma spray coatings. Coating options include
Atmospheric Plasma Spray (APS) YAG, Yttrium Oxyfluoride (YOF), Yttrium Oxide (Y₂O₃), and Suspension
Plasma Spray (SPS) Y₂O₃ coatings. Each is designed to withstand aggressive environments and maintain kit
integrity.
Our coated kits are proven in high-volume manufacturing, operating at more than one million wafer passes
per month. This durability translates to fewer replacements and lower overall costs.